| 摘要 |
PURPOSE:To stop a beam part accurately using a stopper with a simple construction by arranging elastic metal film stoppers on and beneath a semiconductor substrate. CONSTITUTION:Metal stoppers 3 are provided at a support part 2 made of material the same as that of a beam part 1 made of Si surrounding the beam part 1. Two of the stoppers 3 are provided on the surface of the support part 2 and one thereof on the rear of the support part 2. The stoppers 3 on the surface stops an upward excessive movement of the beam part 1 and that on the rear a downward excessive movement of the beam part 1 buffering by the elasticity of the metal. A gap between the beam part 1 and the support part 2, a through hole 11 and a recess 12 are formed by etching from the rear using inorganic alkali such as KOH or organic alkali such as quaternary ammonia hydroxide. A metal film of the stopper 3 is etched in a specified shape after formed on an Si substrate. |
