| 摘要 |
PURPOSE:To form a photoresist layer selectively only in a recess on a substrate with gold controllability without producing photoresist remnants, the significant retreat of the photoresist layer in the recess, damages of the substrate, etc. CONSTITUTION:After a positive type photoresist film 4 is formed on a substrate 1 which has a recess 2 in its surface and brought into contact with alkali solution such as TMAH, the photoresist film 4 is exposed to a monochromatic light 6. Then the substrate 1 is subjected to a heat treatment and, after that, to a development treatment and a photoresist layer 7 is formed only in the recess 2 of the substrate 1. |
