发明名称 Method for processing a substrate surface and an apparatus therefor
摘要 According to the invention, a viscous substance is applied to the undulated surface of a substrate to be processed, and a gravity-like force greater than that of normal gravity is applied to the viscous substance in the direction orthogonal to the principal plane of the substrate. Consequently, the viscous substance applied on the convex parts flows into the concave parts under the influence of the gravity-like force, so as to fill up the concave parts with the viscous substance. As a result, the top of the surface of the substrate is substantially flattened. To apply such gravity, the invention employs a rotor, and a substrate holder supported in part of the rotor in a rotatable manner, and by rotating the rotor at high speed, the substrate holder is automatically rotated, and the substrate mounted on the substrate holder is positioned in the direction orthogonal to the rotating plane of the rotor, so that a kind of gravity by centrifugal force may be applied to the viscous substance.
申请公布号 US5211986(A) 申请公布日期 1993.05.18
申请号 US19900554245 申请日期 1990.07.18
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 OHKUBO, YOSHIO
分类号 B05D1/00;G03F7/16;H01L21/00 主分类号 B05D1/00
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