发明名称 HIGH SATURATION MAGNETIC FLUX DENSITY MAGNETIC MATERIAL AND ITS PRODUCTION
摘要 PURPOSE:To provide magnetic material which allows the same saturation magnetic flux density as Fe16N2 or above and provide its production. CONSTITUTION:Reactive sputtering is performed in the gas atmosphere which contains helium gas and nitrogen element containing gas using pure iron as a target. Thus, high saturation magnetic flux density magnetic material, which allows saturation magnetic flux density of 2.2T or more and that contains 1-15 atomic % of nitrogen element having iron as the major ingredient is produced.
申请公布号 JPH05121216(A) 申请公布日期 1993.05.18
申请号 JP19910307110 申请日期 1991.10.28
申请人 UBE IND LTD 发明人 MATSUBARA KAKUEI;KOYANAGI TAKESHI;FUJII TAKAMITSU;KIMURA TAKAYUKI;YAMAMOTO KAZUTSURA
分类号 H01F1/04;H01F10/14 主分类号 H01F1/04
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