发明名称 MANUFACTURING APPARATUS OF SEMICONDUCTOR
摘要 <p>PURPOSE:To improve visibility of an alignment mark formed on a substrate and to make position alignment of a mask pattern of each layer be executed precisely. CONSTITUTION:An opening 5 is formed virtually in the center of an alignment mark 3 of a second layer and thereby a light is made to strike on a contour part of an alignment mark 1 on a substrate 4 even when the alignment mark 3 of the second layer is fitted for position alignment in the alignment mark 1 on the substrate 4.</p>
申请公布号 JPH05121287(A) 申请公布日期 1993.05.18
申请号 JP19910305336 申请日期 1991.10.24
申请人 OKI ELECTRIC IND CO LTD 发明人 SHINO TOKIO;YAMAGISHI MASAO
分类号 G03F1/42;H01L21/027 主分类号 G03F1/42
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