| 摘要 |
PURPOSE:To manufacture a diffraction grating by which strong X-rays can be obtained by selectively removing an insulating film after forming the insulating film on a substrate that permits X-rays to pass through it and then by plating the exposed substrate surface with gold. CONSTITUTION:After both the sides of Si single crystal substrate 1 of about 100mum are mirror-finished, SiO2 films 2 and 2' are produced by thermal oxidation, etc. Next, Ti is vapor-deposited on film 2 to form film 3, on which resist film 4 is further formed by using photoresist. Resist film 4 is exposed to electron beams, X- rays, etc., and developed to form resist film mask 4''. Film 4'' is used to pattern Ti film 3 by glow discharge of CF4 gas, forming mask 3''. Next, film 2 is etched through reactive ion etching, etc., with CF3 ions to leave film 2''. After films 4'' and 3'' are removed, substrate 1 is dipped in a solution of potassium gold cyanide as a cathode to plate the exposed surface of substrate 1 with gold 5. Thus, the diffraction grating is completed. Instead of striped patterning, coaxial-groove-shaped patterning realizes a diffraction grating of a Fresnel zone plate. |
