Positive light sensitive composition and process for the formation of relief pattern.

摘要

The invention relates to a positive UV-radiation sensitive composition comprising (a1) an organic binder containing acid-labile ether, ester or carbonate groups, or (a2) a water-insoluble polymeric binder soluble in aqueous alkaline solutions and (a2.1) an organic compound whose solubility in an aqueous alkaline developer is increased by the influence of acid, or (a2.2) an organic compound whose solubility in an aqueous alkaline developer is increased by the influence of acid and which contains at least one group cleavable by acid and additionally a group which forms an acid under the influence of radiation, or a mixture of the organic compounds (a2.1) and (a2.2) and b) an arylsulphonic acid ester. This radiation-sensitive composition is suitable for forming relief patterns.