发明名称 |
Positive type light-senstitive composition. |
摘要 |
<p>A positive type light-sensitive composition having less layer shrinkage by baking after exposing, less layer decrease in developing, a good profile and a high resolution comprises: (a) a resin which is insoluble in water and soluble in an alkaline aqueous solution, (b) a compound which generates acid by irradiation with active rays or radial rays, and (c) an acid decomposable dissolution inhibitor, having a molecular weight of not more than 3,000 and having groups decomposable by the action of the generated acid to increase the solubility of said inhibitor in an alkaline developing solution, wherein said inhibitor (c) is at least one compound selected from the group consisiting of (i) compounds having two of said acid decomposable groups which are separated by 10 or more bonded atoms excluding the atoms constituting the acid decomposable groups, or (ii) compounds having at least three of said acid decomposable groups, and two of said groups which are at the farthest positions are separated by 9 or more bonded atoms excluding the atoms constituting the acid decomposable groups. n</p> |
申请公布号 |
EP0541112(A1) |
申请公布日期 |
1993.05.12 |
申请号 |
EP19920119043 |
申请日期 |
1992.11.06 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
YAMANAKA, TSUKASA;AOAI, TOSHIAKI;UENICHI, KAZUYA;KONDO, SHUNICHI;KOKUBO, TADAYOSHI |
分类号 |
G03F7/004;G03F7/039;H01L21/027 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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