发明名称 SEMICONDUCTOR LIGHT DETECTOR AND METHOD OF MANUFACTURING THE SAME
摘要 A semiconductor light detector includes a first semiconductor layer of a first conductivity type having a multi-layer structure including a light absorbing layer and an avalanche multiplicating layer, an annular second semiconductor layer formed on the first semiconductor layer, a light detecting region formed by doping an impurity of a second conductivity type in a surface region of the first semiconductor layer, in such a manner that a peripheral portion of the light detecting region is located outside an inner periphery of the second semiconductor layer, the light detecting region defining a first p-n junction in combination with the first semiconductor layer, and a guard ring formed by doping an impurity of the second conductivity type in a surface region of the second semiconductor layer to surround the peripheral portion of the light receiving region with the first semiconductor layer, the second p-n junction having a concentration gradient lower than that of the first p-n junction. By virtue of the presence of the second semiconductor layer, the junction depth of the peripheral portion of the light detecting region is less than that of the central portion of the light detecting region, and the junction depth of the guard ring is greater than that of the peripheral portion of the light detecting region. As a result, a sufficient guard ring effect can be obtained without a guard ring having a great junction depth.
申请公布号 CA1317664(C) 申请公布日期 1993.05.11
申请号 CA19890614171 申请日期 1989.09.28
申请人 KABUSHIKI SAISHA TOSHIBA 发明人 FURUYAMA, HIDETO;SADAMASA, TETSUO
分类号 H01L21/20;H01L31/107;H01L31/18 主分类号 H01L21/20
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