The method involves removing wax from a substrate using a non-chlorinated solvent process. The substrate is dipped in a hot wax bath or heated in an oven to remove substantially all of the wax. The substrate is then submerged in either a single or a series of hot mineral oil baths to remove any remaining wax. The oil is then removed by a semi-aqueous or light organic cleaner. The semi-aqueous cleaner is subsequently removed in an alkaline-base cleaner bath. Following the alkaline-base cleaner is a cleansing with a rinsing solution preferably a countercurrent series of rinses. Finally, the substrate is dried.
申请公布号
US5209785(A)
申请公布日期
1993.05.11
申请号
US19910785576
申请日期
1991.10.30
申请人
UNITED TECHNOLOGIES CORPORATION
发明人
BREWE, SUSAN;DEAN, ROBERT W.;JAWORSKI, MARK R.;LORETTE, TIMOTHY J.;PACKER, LOUIS L.;ZAVODJANCIK, JOHN P.