发明名称 NON-CHLORINATED SOLVENT DEWAX PROCESS
摘要 The method involves removing wax from a substrate using a non-chlorinated solvent process. The substrate is dipped in a hot wax bath or heated in an oven to remove substantially all of the wax. The substrate is then submerged in either a single or a series of hot mineral oil baths to remove any remaining wax. The oil is then removed by a semi-aqueous or light organic cleaner. The semi-aqueous cleaner is subsequently removed in an alkaline-base cleaner bath. Following the alkaline-base cleaner is a cleansing with a rinsing solution preferably a countercurrent series of rinses. Finally, the substrate is dried.
申请公布号 US5209785(A) 申请公布日期 1993.05.11
申请号 US19910785576 申请日期 1991.10.30
申请人 UNITED TECHNOLOGIES CORPORATION 发明人 BREWE, SUSAN;DEAN, ROBERT W.;JAWORSKI, MARK R.;LORETTE, TIMOTHY J.;PACKER, LOUIS L.;ZAVODJANCIK, JOHN P.
分类号 C25D5/02;C23G1/14;C23G5/00;C23G5/02;H05K3/18;H05K3/26 主分类号 C25D5/02
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