发明名称 |
VHF/UHF reactor system |
摘要 |
A plasma processing reactor is disclosed which incorporates an integral co-axial transmission line structure that effects low loss, very short transmission line coupling of ac power to the plasma chamber and therefore permits the effective use of VHF/UHF frequencies for generating a plasma. The use of VHF/UHF frequencies within the range 50-800 megahertz provides commercially viable processing rates (separate and simultaneous etching and deposition) and substantial reduction in sheath voltages compared to conventional frequencies such as 13.56 MHz. As a result, the probability of damaging electrically sensitive small geometry devices is reduced.
|
申请公布号 |
US5210466(A) |
申请公布日期 |
1993.05.11 |
申请号 |
US19920852826 |
申请日期 |
1992.03.13 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
COLLINS, KENNETH S.;RODERICK, CRAIG A.;YANG, CHAN-LON;WANG, DAVID N. K.;MAYDAN, DAN |
分类号 |
C23C16/509;H01J37/32;H05H1/46 |
主分类号 |
C23C16/509 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|