发明名称 Bath for electrochemical deposition of metal (alloys)
摘要 The bath is contained in a dielectric material tank (1) with at least one antenna arrangement (4) on the tank walls and/or under the tank bottom. A metal screen shields the tank from parasitic electromagnetic waves. At least one transmitter (6) is provided to generate electromagnetic waves to heat the bath, regulated by control devices (7) outside the screen.
申请公布号 DE4203646(C1) 申请公布日期 1993.05.06
申请号 DE19924203646 申请日期 1992.02.08
申请人 LPW-ANLAGEN GMBH, 4040 NEUSS, DE 发明人 MOEBIUS, ANDREAS, PROF. DR.HABIL., 4040 NEUSS, DE
分类号 C25D21/02 主分类号 C25D21/02
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