发明名称 Planar FET-SEED integrated circuits.
摘要 <p>Structure and method for fabricating FETs and quantum well diodes on the same semi-insulating substrate where the FET is provided with enhanced protection from spurious voltages. The structure uses a deeply buried p-layer (17) in a semi-insulating substrate (14) partitioned to isolate the FET portion (40) of the substrate. The same buried p-layer can be partitioned to provide the p-regions of quantum well diodes (30). &lt;IMAGE&gt;</p>
申请公布号 EP0540233(A1) 申请公布日期 1993.05.05
申请号 EP19920309610 申请日期 1992.10.21
申请人 AMERICAN TELEPHONE AND TELEGRAPH COMPANY 发明人 CHIROVSKY, LEO MARIA FREISHYN;D'ASARO, LUCIAN ARTHUR;PEI, SHIN-SHEM;WOODWARD, TED KIRK
分类号 H01L21/822;G02F3/02;H01L27/04;H01L27/095;H01L27/144;H01L27/15;H01L29/80;H01L29/86;H01L31/10 主分类号 H01L21/822
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