发明名称 |
LPCVD reactor for high efficiency, high uniformity deposition and a method of such deposition. |
摘要 |
<p>An injector with a convex wall surface facing the susceptor directs vapor toward a wafer held by a susceptor producing a generally laminar flow across the surface of the wafer that in combination with the convex wall surface prevents formation of recirculation cells in the region between the wafer and the injector. <IMAGE></p> |
申请公布号 |
EP0540082(A1) |
申请公布日期 |
1993.05.05 |
申请号 |
EP19920203171 |
申请日期 |
1992.10.16 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
BARBEE, STEVEN GEORGE;CHAPPLE-SOKOL, JONATHAN DANIEL;CONTI, RICHARD ANTHONY;KOTECKI, DAVID EDWARD |
分类号 |
C23C16/52;C23C16/44;C23C16/455;C30B25/14;H01L21/205 |
主分类号 |
C23C16/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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