METHOD AND DEVICE FOR ISOLATING AND EXPOSING SPATIAL PERIOD

摘要

Soft carbon-K X-rays expose a Poly Methyl Methacralate (PMMA), or Plexiglas*, photoresist on an oxide layer of a silicon substrate through a parent mask separated a distance S from the resist by a spacer with the parent mask slits defining a spatial period p to establish an intensity pattern of period p/n at the photomask with S p2/n .lambda., where .lambda. is the wavelength of the incident radiation and .lambda.<