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发明名称
METHOD AND SYSTEM FOR ELECTRON BEAM EXCITATION DRY ETCHING
摘要
申请公布号
JPH05109675(A)
申请公布日期
1993.04.30
申请号
JP19910291891
申请日期
1991.10.14
申请人
NEC CORP
发明人
WATABE HEIJI
分类号
H01L21/302;H01L21/3065
主分类号
H01L21/302
代理机构
代理人
主权项
地址
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