| 摘要 |
PURPOSE:To investigate and optimize an exposure device and resist process technology by arranging a specific line and space group on a line and space pattern with a constant period. CONSTITUTION:The target mask is manufactured by using a mask where the group of four kind of lines 1 and spaces 2 differing in duty ratio are arranged on the line and space pattern having the constant period. Namely, the four kinds are made to properly deviate in design value, bit by bit, when designed (correction values for the lines 1 and spaces 2 are equal and the pitch 2a is constant) to match a dozing quantity with a desired line and a space even when the quantity is improper. After a mask is formed, its size is measured and only a mask having the desired lines and spaces is used. Therefore, even if a size error is generated in the mask manufacture, the mask within a specific size precision range can be manufactured. |
