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发明名称
CLEANING METHOD FOR SEMICONDUCTOR SILICON WAFER
摘要
申请公布号
JPH05109681(A)
申请公布日期
1993.04.30
申请号
JP19910085935
申请日期
1991.03.27
申请人
MITSUBISHI MATERIALS CORP
发明人
MORITA ETSURO;SAKURAI MARI;OKUDA HITOSHI;SHIMANUKI YASUSHI
分类号
H01L21/304
主分类号
H01L21/304
代理机构
代理人
主权项
地址
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