| 摘要 |
<p>Methods and reactors are described for the production of high temperature superconductor films on a variety of substrates, particularly those films which include volatile components during their manufacture. The reactors are particularly useful for producing films containing thallium. The reactors parts (10, 12, 14, 16) provide for relatively low volume cavities in which the substrate (22) is disposed, and control of the thallium oxide overpressure during the processing. In a preferred embodiment, one or more holes or apertures are made in the reactor to permit thallium and thallium oxide to controllably leak from the reactor. For manufacture of double sided superconducting films, a reactor is used having top (14) and bottom (10) plates each with one or more holes in them (18, 20). Uniform high temperature superconducting films are obtained while inhibiting reaction between the substrate and superconducting film during the processing.</p> |
