发明名称 METHOD FOR TREATING ETCHANT
摘要 In order to ensure an easy operation a decreased cost in maintenance and installation and a safely and effective use of chlorine gas generated in a closed system, a new method for treating an etchant is offered. The method comprises the following steps of; (1) treating an etchant including copper (1) chloride or ferric chloride containing copper by means of an electrolysis using a diaphragm to withdraw copper electrolytically deposited in a cathode cell, (2) supplying chlorine gas generated in an anode cell into another etchant used in an etching process, thereby enabling the etchant to be regenerated.
申请公布号 CA2081578(A1) 申请公布日期 1993.04.29
申请号 CA19922081578 申请日期 1992.10.28
申请人 MIKAMI, YASUIE;OISAKI, MASAAKI;SHIBASAKI, MASAO 发明人 MIKAMI, YASUIE;OISAKI, MASAAKI;SHIBASAKI, MASAO
分类号 C23F1/46;C25F7/02;(IPC1-7):C23F1/46 主分类号 C23F1/46
代理机构 代理人
主权项
地址