发明名称 |
METHOD FOR TREATING ETCHANT |
摘要 |
In order to ensure an easy operation a decreased cost in maintenance and installation and a safely and effective use of chlorine gas generated in a closed system, a new method for treating an etchant is offered. The method comprises the following steps of; (1) treating an etchant including copper (1) chloride or ferric chloride containing copper by means of an electrolysis using a diaphragm to withdraw copper electrolytically deposited in a cathode cell, (2) supplying chlorine gas generated in an anode cell into another etchant used in an etching process, thereby enabling the etchant to be regenerated.
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申请公布号 |
CA2081578(A1) |
申请公布日期 |
1993.04.29 |
申请号 |
CA19922081578 |
申请日期 |
1992.10.28 |
申请人 |
MIKAMI, YASUIE;OISAKI, MASAAKI;SHIBASAKI, MASAO |
发明人 |
MIKAMI, YASUIE;OISAKI, MASAAKI;SHIBASAKI, MASAO |
分类号 |
C23F1/46;C25F7/02;(IPC1-7):C23F1/46 |
主分类号 |
C23F1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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