发明名称 Cold conductor contact metallisation - invovles use of titanium as protective layer or as layer for stop layer construction
摘要 The employment of titanium as a stop layer construction for contact metallisation involves the application of a nickel layer as solderable diffusion stop. On the nickel layer is applied a protective layer of silver. Where a double layer metallisation is requierd, between the cold conductor and the titanium protective layer is applied an aluminium layer for stop layer construction. The titanium layer has a thickness of a few tenths of a micrometre. USE/ADVANTAGE - Titanium used as a protective layer for cold conductor contact metallisation.
申请公布号 DE4130772(A1) 申请公布日期 1993.04.29
申请号 DE19914130772 申请日期 1991.09.16
申请人 SIEMENS MATSUSHITA COMPONENTS GMBH & CO. KG, 8000 MUENCHEN, DE 发明人 KARNER, ROBERT, GRAZ, AT
分类号 C23C28/02;H01C1/14;H01C7/02 主分类号 C23C28/02
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