| 摘要 |
DN 7840 A sterilization method and apparatus wherein microorganisms are exposed to ultraviolet light characterized by providing and operating a mercury/gallium metal halide ultraviolet light source in a manner exposing the microorganisms to ultraviolet light and a gaseous titanium dioxide emitted from the source for an exposure time in the range from about 0.3 seconds to about 60 seconds and at an exposure distance in the range from about 0.25 inch to about 4.0 inches, the ultraviolet light being emitted through a wavelength range from about 175 nanometers to about 450 nanometers with the relative energy being in the range from equal to or greater than 1.3 to equal to or less than 250 microwatts/sq.cm./nanometer at one meter. When the microorganisms are on the surface of an object, the surface is exposed to the ultraviolet light and to the titanium dioxide to provide a dynamic sterilization process on the surface so that the critical surface tension on the surface is changed and biological contaminant layers are actively removed from the surface without altering the originality of the surface which eliminates any shielding or screening of microorganisms on the surface and which provides complete sterilization on the surface with microcombustion of microorganisms. In addition, ozone-free quartz is provided in operative relation between the light source and the microorganisms. |
