发明名称 Vapor deposition apparatus
摘要 An argon (Ar+) laser has a resonator. A reaction chamber is integrally formed in the resonator. A voltage is applied to electrodes, which discharge electricity to excite argon atoms in the resonator to produce a laser beam. The laser beam is continuously oscillated between total reflection mirrors disposed at opposite ends of the resonator. A substrate is disposed in the reaction chamber into which a material gas is introduced. The material gas absorbs the laser beam, to decompose and deposit as a thin film over the substrate.
申请公布号 US5205870(A) 申请公布日期 1993.04.27
申请号 US19920890145 申请日期 1992.05.29
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 SATO, YUUSUKE;UI, AKIO;AKAGAWA, KEIICHI;OHMINE, TOSHIMITSU
分类号 H01L21/205;C23C16/48 主分类号 H01L21/205
代理机构 代理人
主权项
地址