发明名称 |
X-RAY MASK STRUCTURE BODY, ITS MANUFACTURE AND X-RAY EXPOSURE METHOD USING THE SAME X-RAY MASK STRUCTURE BODY |
摘要 |
<p>PURPOSE:To provide a stable X-ray mask wherein the dislocation of a mask pattern is not caused against a change in the temperature of the X-ray mask. CONSTITUTION:An X-ray mask structure body is composed of the following: an X-ray absorber 3 having a desired pattern; an X-ray transmitting film 2 which holds the absorber; and a support frame 1 which supports the X-ray transmitting film. In the X-ray mask structure body and its manufacturing method, a layer which is composed of at least one kind of material whose coefficient of linear expansion is the same as the coefficient of linear expansion of the X-ray transmitting film 2 is provided on the pattern of the X-ray absorber.</p> |
申请公布号 |
JPH05102013(A) |
申请公布日期 |
1993.04.23 |
申请号 |
JP19910287280 |
申请日期 |
1991.10.08 |
申请人 |
CANON INC |
发明人 |
MAEHARA HIROSHI |
分类号 |
C01B31/36;G03F1/22;H01L21/027;H01L21/30 |
主分类号 |
C01B31/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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