发明名称 PHOTOSENSITIVE COMPOSITION
摘要 PURPOSE:To obtain superior exposure visualizability at the time of low exposure by incorporating a quinonediazido compound, an alkali-soluble resin, a compound to be allowed to produce an acid by exposure, an organic dye, and a specified halogen compound. CONSTITUTION:This photosensitive composition contains at least a quinonediazido compound, an alkali-soluble resin, a compound to be allowed to produce an acid by exposure, and the organic dye, and the compound represented by formula I in which each of R<1>-R<3> is H, halogen, or alkyl halide but at least one of them is alkyl halide; and X is N or CH. An amount of the acid-producing compound to be added is, preferably, 0.2-10weight%, especially, 0.5-3weight% of the total solid weight of the composition, and an amount of the halogen compound to be added is, preferably, 0.2-10weight%, especially, 0.5-3weight% of the total solid weight, thus permitting the obtained photosensitive composition to have superior superior exposure visualizability at the time of low exposure.
申请公布号 JPH05100422(A) 申请公布日期 1993.04.23
申请号 JP19910262376 申请日期 1991.10.09
申请人 MITSUBISHI KASEI CORP;KONICA CORP 发明人 KAMIMURA JIRO;SASAKI MITSURU;NAKAI HIDEYUKI;AKIYAMA TAKEO;MATSUMURA TOMOYUKI;SUZUKI TOSHITSUGU
分类号 G03F7/004;G03F7/022;H01L21/027 主分类号 G03F7/004
代理机构 代理人
主权项
地址