| 摘要 |
PURPOSE:To enable application to a positive type resist or the like acting through the 2 wavelength sensitization reaction by using the composition comprising one of benzophenone type photosensitive polyimides and a sensitizer. CONSTITUTION:This photosensitive resin composition comprises the known benzophenone type photosensitive polyimido having repeating units each represented by formula I and the sensitizer, and in formula I-IV, R is a group represented by formulae II-IV or the like; n is usually 50-100; each of X<1>-X<3> is H, lower alkyl, lower alkoxy, or the like; Y<1> is O, S, or lower alkylene; each m and l is an integer of 1-3; and p is an integer of 1-10. The sensitizer of the second constituent preferably has an absorption in the wavelength region of 400-650nm, thus permitting a superior image to be formed by using the difference in solubility between exposed parts and unexposed parts and when a suitable developer is used, this image forming method can be applied to the positive type resist or the like. |
