DEVELOPER FOR POSITIVE TYPE RADIATION SENSITIVE RESIST

摘要

PURPOSE:To provide an org. alkali developer for a positive type radiation sensitive resist capable of suppressing a dimensional change of a resist pattern after development whether the pattern is dense or not. CONSTITUTION:This developer for a positive type radiation sensitive resist contg. alkali-soluble phenol resin and quinonediazidosulfonic ester is an aq. org. alkali soln. contg. org. quat. ammonium hydroxide and boric acid.