| 摘要 |
PURPOSE:To provide the method for inspecting reticules to inspect the reticule disposed with the pattern of one semiconductor integrated circuit on one sheet of the reticule. CONSTITUTION:This method for inspecting the reticules consists of inclining the reticule 1 to be inspected at >=2 different angles, exposing and developing the reticule to form >=2 resist patterns 7 on a substrate 9 and comparing these resist patterns 7 at the time of forming the resist patterns 7 on the substrate 9 by using the reticule 1. |
