| 摘要 |
PURPOSE:To provide a mask correcting method which separates a mask pattern and a defect and can correct the defect without damaging a glass surface in the correction of the pattern which cannot separate the mask pattern and the defective part. CONSTITUTION:Mask pattern data is taken into an FIB correcting device and the sepn. of the mask pattern 5 and the defect part is executed by depositing a film 8. The defect is corrected in compliance with the contour of the film 8 by a laser repair device, by which the defect can be corrected without damaging the glass surface. |
