| 摘要 |
a) Process for the deposition on at least one article, especially a metal article, of a hard layer based on diamond pseudocarbon by the so-called "CVD assisted plasma" technique, by which a carbon-containing gas is introduced into a vacuum chamber containing a metal support connected to a current generator and on which the article to be coated is situated, and an electrical discharge is maintained inside the chamber so as to raise the temperature of the article to a value of the order of 100 to 200@C and under power and pressure conditions permitting the physical and chemical excitation of the gas and its ionisation so as to cause the deposition of a hard layer based on diamond pseudocarbon on the article. b) This process is characterised in that the carbon-containing gas consists of at least one C6-C8 hydrocarbon used in combination with a doping agent, itself consisting of a carbon-, boron- and nitrogen-containing molecule which has the same number of nitrogen atoms and of boron atoms.
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