| 摘要 |
<p>PURPOSE:To obtain the defective mask for a photomask inspecting device which can make photomask defect inspection with high accuracy and the process for production thereof. CONSTITUTION:The prescribed part of a light shielding part 2 consisting of chromium (Cr), etc., on a photomask is formed thin by dry etching to form a defect pattern 4 having the intermediate light transmittance of the light shielding part 2 and the glass substrate 1. The relation between the defect size to be transferred to a wafer and the light transmittance of the defect is correctly recognized in this way and the calibration of the photomask inspecting device is optimized.</p> |
