发明名称 METHOD FOR SELECTIVELY HEATING FILM ON SUBSTRATE
摘要 PURPOSE: To rapidly heat only a film on a substrate to a high temperature without heating the substrate. CONSTITUTION: In a method for selectively heating a film 12 on a substrate 14, the film is allowed to have light absorption characteristics that are different from the absorption characteristics for the substrate and light 10 with the maximum intensity at a wavelength that is essentially absorbed by the film and at the same time cannot be absorbed essentially by the substrate 14 is applied to the sample (obtained by combining the film and the substrate).
申请公布号 JPH0594995(A) 申请公布日期 1993.04.16
申请号 JP19910058766 申请日期 1991.03.22
申请人 P-KU SYST INC 发明人 TEIMOSHII JIEI SUTARUTSU
分类号 H01L21/00;H01L21/20;H01L21/26;H01L21/268;H01L21/336;H01L29/78;H01L29/786;H01L31/04 主分类号 H01L21/00
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