| 摘要 |
<p>Apparatus for sputtering thin coatings of material on to a substrate from a chamber subject to substantial evacuation during use, which includes: a substantially cylindrical tube (1) having a coating on a surface thereof of the material to be sputtered magnetic means (4) associated with the tube for assisting the sputtering process means for causing rotation (7) of the tube relative to the magnetic means about its longitudinal axis wherein the coating is present on the internal surface of the tube (1) and the magnetic means (4) are situated externally of the tube (1). <IMAGE></p> |
