发明名称 Silver halide light-sensitive film material subjected to antistatic treatment
摘要 The present invention provides a silver halide light-sensitive film material having a backcoat layer which is sufficiently subjected to antistatic treatment. This material has an electrically conductive polymer layer comprising a copolymer of N-methylol(meth)acrylamide and styrenesulfonic acid as an antistatic layer between a film base and the backcoat layer.
申请公布号 US5202223(A) 申请公布日期 1993.04.13
申请号 US19910758602 申请日期 1991.09.12
申请人 MITSUBISHI PAPER MILLS LIMITED 发明人 SHIBATA, YOSHIO;SUMI, SEIICHI;FURUKAWA, AKIRA
分类号 G03C1/76 主分类号 G03C1/76
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