| 摘要 |
PURPOSE:To completely remove resist in a method for removing the resist during a lithographic step. CONSTITUTION:Resist is subjected to ultrasonic cleaning in an organic solvent tank, then subjected to ultrasonic cleaning in a water tank, again subjected to ultrasonic cleaning in the solvent tank and further rinsed with water to peel a film difficult to be solved in an organic solvent and formed by solidifying the surface of the resist. Thus, the resist can be completely dissolved to be removed, and a malfunction of removing the resist can remarkably be reduced. |
