VERFAHREN ZUR HAFTUNG EINER SCHICHT AUS EINEM METALL MIT HOHEM SCHMELZPUNKT AUF EINEM SUBSTRAT.

摘要

A method for fabricating a structure, which includes a layer (2) containing a refractory metal and a substrate (3) to which the refractory metal-containing layer does not strongly adhere, there being a thin bonding layer (5) between the substrate (3) and the refractory metal-containing layer (2) for providing good adherence between the refractory metal-containing layer and the substrate. The bonding layer (5) is an oxide, nitride or mixed osy-nitride layer initially prepared to be Si-rich in a surface region thereof. Inclusions (7) of the refractory metal are produced in the bonding layer (5) by substituting the refractory metal for excess free silicon (6) therein. These inclusions become nucleation and bonding sites for refractory metal deposition, ensuring good adhesion.