发明名称 |
PRODUCTION OF THIN FILM PATTERN |
摘要 |
PURPOSE:To provide a production method for a thin film pattern having high throughput and needless to join together mask patterns even when using a substrate of large area. CONSTITUTION:In the production method for the thin film pattern by forming and arranging the mask pattern 5 on the thin film 2 after the thin film 2 is provided on the substrate 1 and by removing the exposed part of the thin film 2 by etching to execute patterning of the thin film 2, the organic resin layer 3 is formed by uniformly applying an organic resin on the whole surface of the substrate 1 provided with the thin film 2 and the mask pattern 5 is formed on the thin film 2 by pressing the organic resin layer 3 with the stamper 4 having the same unevenness as the mask pattern 5 and almost the same dimension as the substrate 1.
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申请公布号 |
JPH0580530(A) |
申请公布日期 |
1993.04.02 |
申请号 |
JP19910270458 |
申请日期 |
1991.09.24 |
申请人 |
HITACHI LTD |
发明人 |
KUWABARA KAZUHIRO;MORI YUJI;MIKAMI YOSHIAKI |
分类号 |
C23F1/00;G03F7/00;G03F7/26;H01L21/027;H01L21/033;H01L21/302;H01L21/3065;H05K3/06 |
主分类号 |
C23F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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