发明名称 POSITIVE PHOTORESIST COMPOSITION
摘要 PURPOSE:To obtain a high resolution pattern excellent in sensitivity, developing property and heat resistance by containing an alkali soluble low molecular weight compound, at least a part of hydroxy group of which is sulfonylated by a specific sulfonylating agent. CONSTITUTION:The alkali soluble low molecular weight compound obtained by sulfonylating at least a part of hydroxy group of an alkali soluble resin, a quinone diazide compound and a polyhydroxy compound with the sulfonylating agent expressed by the formula I is contained. In the formula I, R1 is aliphatic hydrocarbon group or a group expressed by the formula II, X is alkylene group, alkenylene group or single bond, R2 is hydrogen atom, alkyl group, alkoxy group, alkenyl group or carboxyl group (in the case that X is single bond, hydrogen atom and alkyl group are excepted). The sulfonylating agent expressed by the formula I is methane sulfonic chloride (B), ethane sulfonic chloride (C) or the like as a concrete example.
申请公布号 JPH0580509(A) 申请公布日期 1993.04.02
申请号 JP19910239698 申请日期 1991.09.19
申请人 FUJI PHOTO FILM CO LTD 发明人 KAWABE YASUMASA;UENISHI KAZUYA;KOKUBO TADAYOSHI
分类号 G03F7/004;G03F7/022;H01L21/027 主分类号 G03F7/004
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