| 摘要 |
PURPOSE:To efficiently provide the optical control element having good characteristics by the process for production which increases the etching rate of a substrate and increases the difference in the etching rate from a mask material. CONSTITUTION:A Ti film 303 is formed over the entire surface on an LiNbO3 substrate 301 on which optical waveguides 302 are formed. Resist patterns 304 formed with dug parts as grooves by a photoprocess are formed on the Ti film 303. The Ti film 303 is etched by using the resist patterns 304 as a mask and the photoresist is dissolved, by which Ti patterns 305 of the same shape as the shape of the resist patterns 304 are obtd. This substrate is immersed into benzoic acid 306 and is rested after heating, by which the exposed parts are proton-exchanged. The Ti film 303 is dissolved by etching such parts, by which the optical control element having projecting parts 309 is formed. |
