| 摘要 |
PURPOSE:To provide a negative photosensitive composition high in sensitivity, resolution and furthermore almost free from generation of remaining of development. CONSTITUTION:In a photosensitive negative resist composition which consists of a photo acid generating agent, an acid hardener and an alkali soluble resin, the alkali soluble resin is a novolac resin obtained by co-condensating m-cresol and p-cresol with formaldehyde and in <13>C-NMR spectrum of dimethyl sulfoxide deuteride solution of the resin, relation between X=A/(A+B+C) and m-cresol content in the novolac resin is regulated to correspond to the slant line part (including a part on the line around the slant line part) in the figure, in this case, A is integral value of peak from 23.0ppm to 31.0ppm, B is integral value of peak from 31.0ppm to 34.0ppm, C is integral value of peak from 34.0ppm to 37.0ppm. |
