BUFFER MASK FOR REACTIVE ION ETCHING,申请号JP19910036236-传众专利搜索

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发明名称	BUFFER MASK FOR REACTIVE ION ETCHING
摘要
申请公布号	JPH0582636(A)	申请公布日期	1993.04.02
申请号	JP19910036236	申请日期	1991.03.01
申请人	INTERNATL BUSINESS MACH CORP <IBM>	发明人	DEEBITSUDO ROURANTO HAAMON;MAIKERU RIN KAABOU;NANSHII TOBEI PASUKOU;JIYON FURANSHISU REMUBETSUTOSUKI
分类号	H01L21/302;H01L21/3065;H01L21/308;H01L21/76	主分类号	H01L21/302
代理机构		代理人
主权项
地址

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