发明名称 CRYSTALLOGRAPHIC ORIENTATION MEASURING METHOD FOR CRYSTAL COMPONENTS, ESPECIALLY FOR ROUND COMPONENTS
摘要 The method for measuring crystallographic orientation of crystallic elements, in particular of round elements, quartz plates by measuring angles between the surface of a crystallic element and the selected atomic planes using an X-ray goniometer with monochromatic radiation while rotating the crystallic element around the axis perpendicular to its surface, consisting in that the measured element rotates on a rodman arranged at a slightly smaller angle than the position of the expected diffractive reflection, until two consecutive maxima of reflection intensity occur, and then the element under measurement is placed in an intermediate position between the maximum reflection positions, the rodman is arranged at an angle slightly above the reflection maximum, and then in turn by rotation of the plate and of the rodman, the diffractive reflection maximum is set, while the angle readout on the goniometer is the angle between the plate surface and the atomic plane.<IMAGE>
申请公布号 PL160408(B1) 申请公布日期 1993.03.31
申请号 PL19890282618 申请日期 1989.12.04
申请人 发明人
分类号 G01B9/10;(IPC1-7):G01B9/10 主分类号 G01B9/10
代理机构 代理人
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