发明名称 Exposure apparatus for forming image.
摘要 <p>An appropriate photochemical reaction is produced in electrodeposited photoresist applied to the surface of a board and to the inner wall surfaces of holes extending through the board, for improving the efficiency of the operation of image formation. Upper and lower ultraviolet illumination devices and upper and lower light condensers (34a, 34b) are provided. Each ultraviolet illumination device has a discharge lamp (32) and a reflecting mirror (33). Each light condenser consists of a horizontal array of a multiplicity of lenses (35) placed close to each other. The upper and lower ultraviolet illumination devices are disposed respectively above and below the board (31) in a symmetrical relation with respect to the board. The upper light condenser (34a) is disposed between the upper discharge lamp (32) and the board (31), while the lower light condenser (34b) is located between the lower discharge lamp (32) and the board (31). These light condensers which are spaced from each other can be moved horizontally. The lenses (35) are optically arranged in such a way that ultraviolet rays passed through the lenses (35) form conically divergent light surrounding the optical axes of the lenses. &lt;IMAGE&gt;</p>
申请公布号 EP0534598(A1) 申请公布日期 1993.03.31
申请号 EP19920307294 申请日期 1992.08.10
申请人 ORC MANUFACTURING CO., LTD. 发明人 WATANUKI, MINORU
分类号 H05K3/06;G03F7/20;H01L21/027;H05K3/00 主分类号 H05K3/06
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