发明名称 A photographic light-sensitive material having antistatic properties with good storage stability.
摘要 A photographic light-sensitive material is coated with an antistatic layer comprising an antistatic agent, a polymeric thickener and a fluorinated compound having at least one oxyethylene unit in its molecular structure to improve the preservation of the properties of said antistatic layer after storage of said material for a long time.
申请公布号 EP0534006(A1) 申请公布日期 1993.03.31
申请号 EP19910202473 申请日期 1991.09.24
申请人 AGFA-GEVAERT NAAMLOZE VENNOOTSCHAP 发明人 VANDENABEELE,HUBERT
分类号 G03C1/38;G03C1/89 主分类号 G03C1/38
代理机构 代理人
主权项
地址