发明名称 ELECTROOPTIC DEVICE AND ITS PRODUCTION
摘要 <p>PURPOSE:To avoid deposition of dust during production or displacement between a mask and a substrate and to improve the numerical apperture to obtain good contrast by covering the whole surface of the effective display area except for picture element electrode with a light shielding film. CONSTITUTION:On the one substrate of two insulating transparent substrates 2, there are formed a transparent electrode film 3 for picture element electrode, nonlinear resistor film 6, and signal electrode film 7 to constitue a nonlinear resistor element. The other insulating transparent substrate is provided with a transparent film 3 for picture element electrode. These two substrates are adhered with a spacer material and a sealing material as a buffer, and a liquid crystal is sealed between the substrates to form a cell. Then light-shielding films 1, 9 are formed on the back surface of the substrate having the nonlinear resistor element, on which a protective film 13 is formed to protect the light- shielding films. Thereby, by adding the light-shielding films 1, 9 on the area except for the picture element part, high contrast can be obtd.</p>
申请公布号 JPH0572565(A) 申请公布日期 1993.03.26
申请号 JP19910234846 申请日期 1991.09.13
申请人 SEIKO INSTR INC 发明人 ONIWA HIROTOMO
分类号 G02F1/136;G02F1/1365 主分类号 G02F1/136
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