发明名称 DETECTING METHOD FOR SUBSTRATE OF SEMICONDUCTOR DEVICE
摘要 PURPOSE:To detect the substrate easily and positively in non-contact by a method wherein fixed light projected from a projecting means is transmitted to the substrate, and projecting light attenuated depending upon the transmissivity of the substrate is detected. CONSTITUTION:A plurality of sapphire substrates 1 are housed in a carrier frame, the substrates 1 are singly extracted successively from the carrier frame while being each transferred to fixed manufacturing process locations 1', 1'', 1''', and the substrates are placed on a base plate 6, a vacuum chuck 7, a conveyor base 8, etc. respectively and transported. When the substrate at the location of 1'', a projecting means device 2 for projecting fixed light beams and a light receiving means device are fastened in non-contact and at proper intervals on a light path 9 common in the upper and lower surface direction, avoiding the chuck 7. When there is the substrate, the existence of the substrate can be detected by means of a comparing detecting means because the quantity of light is attenuated depending upon the transmissivity.
申请公布号 JPS5636138(A) 申请公布日期 1981.04.09
申请号 JP19790111163 申请日期 1979.08.31
申请人 FUJITSU LTD 发明人 SASAKI NOBUO
分类号 H01L21/67;H01L21/50;(IPC1-7):01L21/50 主分类号 H01L21/67
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