| 摘要 |
<p>An aqueous developable, photocurable composition and a method of improving solvent resistance and flexibility are disclosed. The composition comprises (a) an acid-containing copolymer having an acid ephr of at least 0.20 and (b) an acid-containing polymer suitable for flexibilizing the composition, which has at least one free ethylenically unsaturated group. It is preferable that either (a) or (b) or both are further reacted with a compound having a free ethylenically unsaturated group and a free acid reactive group, e.g. glycidyl(meth)acrylate. When the composition is formulated with an ethylenically unsaturated monomer and photoinitiator, the photocurable composition is especially suitable for use in an aqueous developable, flexible printing plate.</p> |
