发明名称 Metal insulator semiconductor field effect transistor
摘要 A Metal Insulator Semiconductor Field-Effect Transistor (MISFET) has an insulating layer arranged between a gate electrode and a semiconductor substrate. The insulating layer is a layer of amorphous, hydrogenated carbon (a-C:H) with a thickness-in the region of the gate electrode-of up to 1 mu m, and with a resistivity ( eta ) greater than or equal to 106 OMEGA xcm at the boundary surface to the semiconductor substrate. The semiconductor substrate consists of a semiconductor material other than silicon.
申请公布号 US5196907(A) 申请公布日期 1993.03.23
申请号 US19920924422 申请日期 1992.07.31
申请人 SIEMENS AKTIENGESELLSCHAFT 发明人 BIRKLE, SIEGFRIED;KAMMERMAIER, JOHANN
分类号 H01L21/04;H01L21/28;H01L21/314;H01L29/51 主分类号 H01L21/04
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