发明名称 |
Metal insulator semiconductor field effect transistor |
摘要 |
A Metal Insulator Semiconductor Field-Effect Transistor (MISFET) has an insulating layer arranged between a gate electrode and a semiconductor substrate. The insulating layer is a layer of amorphous, hydrogenated carbon (a-C:H) with a thickness-in the region of the gate electrode-of up to 1 mu m, and with a resistivity ( eta ) greater than or equal to 106 OMEGA xcm at the boundary surface to the semiconductor substrate. The semiconductor substrate consists of a semiconductor material other than silicon.
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申请公布号 |
US5196907(A) |
申请公布日期 |
1993.03.23 |
申请号 |
US19920924422 |
申请日期 |
1992.07.31 |
申请人 |
SIEMENS AKTIENGESELLSCHAFT |
发明人 |
BIRKLE, SIEGFRIED;KAMMERMAIER, JOHANN |
分类号 |
H01L21/04;H01L21/28;H01L21/314;H01L29/51 |
主分类号 |
H01L21/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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