Selected block phenolic oligomers and their use in radiation-sensitive resist compositions
摘要
Block phenolic oligomers of the formula (I): <IMAGE> (I) These may be reacted alone or with selected phenolic monomers during or after the formation of a phenolic novolak resin thereby said resin having at least one unit of formula (II): <IMAGE> (II)
申请公布号
US5196289(A)
申请公布日期
1993.03.23
申请号
US19910711350
申请日期
1991.06.04
申请人
OCG MICROELECTRONIC MATERIALS, INC.
发明人
JEFFRIES, III, ALFRED T.;HONDA, KENJI;BLAKENEY, ANDREW J.;TADROS, SOBHY
