PROCESS FOR PRODUCING A SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING A MISFET,申请号HK19930000209-传众专利搜索

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发明名称	PROCESS FOR PRODUCING A SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING A MISFET
摘要
申请公布号	HK20993(A)	申请公布日期	1993.03.19
申请号	HK19930000209	申请日期	1993.03.11
申请人	HITACHI, LTD.	发明人	OKUYAMA, KOUSUKE;SUZUKI, NORIO;MEGURO, SATOSHI;NAGASAWA, KOUICHI
分类号	H01L27/092;H01L21/336;H01L21/8234;H01L21/8238;H01L27/088;H01L29/41;H01L29/417;H01L29/423;H01L29/78;(IPC1-7):H01L21/82;H01L21/00;H01L21/265;H01L21/28;H01L27/08	主分类号	H01L27/092
代理机构		代理人
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地址

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